Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces
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CitationBerthod L. Bichotte M. Verrier I. Veillas C. Kämpfe T. Vocanson F. Langlet M. Laukkanen J. Parriaux O. Jourlin Y. (2017). Efficient reversible phase mask for TiO2 submicron gratings directly printed on cylindrical surfaces. OPTICS EXPRESS: THE INTERNATIONAL ELECTRONIC JOURNAL OF OPTICS, 25 (8) , 9003-9009. 10.1364/OE.25.009003.
In this article we present a radial phase mask specially designed and manufactured for direct micro-structuration under UV photolithography of a cylindrical surface covered by a photoresist TiO2 film. The period of the phase mask is sub-micron (between 480 nm and 720 nm) and allows direct printing on several types of cylindrical components. With this dedicated reversible phase mask we have demonstrated the feasibility of a TiO2 grating with a period of 960 nm, printed on a SiO2 cylinder or inside a SiO2 tube of 8 mm diameter.