Show simple item record

dc.contributor.authorHansen Poul-Erik
dc.contributor.authorMadsen Morten H
dc.contributor.authorLehtolahti Joonas
dc.contributor.authorNielsen Lars
dc.date.accessioned2017-11-01T12:08:08Z
dc.date.available2017-11-01T12:08:08Z
dc.date.issued2017
dc.identifier.urihttps://erepo.uef.fi/handle/123456789/4458
dc.description.abstractDimensional measurements of multi-patterned transmission gratings with a mixture of long and small periods are great challenges for optical metrology today. It is a further challenge when the aspect ratio of the structures is high, that is, when the height of structures is larger than the pitch. Here we consider a double patterned transmission grating with pitches of 500 nm and 20 000 nm. For measuring the geometrical properties of double patterned transmission grating we use a combined spectroscopic Mueller polarimetry and scatterometry setup. For modelling the experimentally obtained data we rigorously compute the scattering signal by solving Maxwell's equations using the RCWA method on a supercell structure. We also present a new method for analyzing the Mueller polarimetry parameters that performs the analysis in the measured variables. This new inversion method for finding the best fit between measured and calculated values are tested on silicon gratings with periods from 300 to 600 nm. The method is shown to give results within the expanded uncertainty of reference AFM measurements. The application of the new inversion method and the supercell structure to the double patterned transmission grating gives best estimates of dimensional quantities that are in fair agreement with those derived from local AFM measurementsen
dc.language.isoENen
dc.publisherElsevier BVen
dc.relation.ispartofseriesApplied Surface Scienceen
dc.relation.urihttp://dx.doi.org/10.1016/j.apsusc.2017.02.091en
dc.rightsCC BY-NC-ND https://creativecommons.org/licenses/by-nc-nd/4.0/en
dc.subjectMueller polarimetryen
dc.subjectScatterometryen
dc.subjectEllipsometryen
dc.subjectGratingen
dc.subjectNanostructuresen
dc.subjectMetrologyen
dc.titleTraceable Mueller polarimetry and scatterometry for shape reconstruction of grating structuresen
dc.description.versionfinal draften
dc.contributor.departmentDepartment of Physics and Mathematics, activitiesen
uef.solecris.id46492605en
dc.type.publicationinfo:eu-repo/semantics/articleen
dc.rights.accessrights© Elsevier B.Ven
dc.relation.doi10.1016/j.apsusc.2017.02.091en
dc.description.reviewstatuspeerRevieweden
dc.format.pagerange471-479en
dc.relation.issn0169-4332en
dc.relation.volume421, Part Ben
dc.rights.accesslevelopenAccessen
dc.type.okmA1en
dc.type.versioninfo:eu-repo/semantics/acceptedVersionen
uef.solecris.openaccessEi


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record