Fabrication of buried nanostructures by atomic layer deposition
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CitationAli, Rizwan. Saleem, Muhammad Rizwan. Roussey, Matthieu. Turunen, Jari. Honkanen, Seppo. (2018). Fabrication of buried nanostructures by atomic layer deposition. Scientific reports, 8, 15098. 10.1038/s41598-018-33036-3.
We present a method for fabricating buried nanostructures by growing a dielectric cover layer on a corrugated surface profile by atomic layer deposition of TiO2. Selecting appropriate process parameters, the conformal growth of TiO2 results in a smooth, nearly flat-top surface of the structure. Such a hard surface can be easily cleaned without damage, making the nanostructure reusable after contamination. The technique has wide applicability in resonance-domain diffractive optics and in realization of quasi-planar metamaterials. We discuss design issues of such optical elements and demonstrate the method by fabricating narrow-band spectral filters based on the guided-mode resonance effect. These elements have strong potential for, e.g., sensing applications in harsh conditions.