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dc.contributor.authorReduto, I
dc.contributor.authorRaskhodchikov, D
dc.contributor.authorGangrskaia, E
dc.contributor.authorKaasik, V
dc.contributor.authorSvirko, Yu
dc.contributor.authorLipovskii, A
dc.date.accessioned2019-02-20T13:28:11Z
dc.date.available2019-02-20T13:28:11Z
dc.date.issued2018
dc.identifier.urihttps://erepo.uef.fi/handle/123456789/7463
dc.description.abstractWe present studies of reactive ion etching of glasses modified by electric field applied to the glasses at elevated temperature. Voltage dependence of the thickness of the modified glass layers is revealed. Secondary ion mass spectrometry data are used to establish the relation between the ion etching rate of the electric field modified glasses and their local composition resulted from the modification. Using structured anodic electrodes allows formation of nanoscale relief structures on the glass surface because of the volume relaxation of the modified regions. This is thermal electric field imprinting procedure. It is shown that the reactive ion etching allows effective deepening the glass surface relief formed in the course of the imprinting. The reactive ion etching allows keeping a high lateral resolution of the surface relief formed in the imprinting. The formation of gratings with micron-scale periodicity is demonstrated.
dc.language.isoenglanti
dc.publisherIOP Publishing
dc.relation.ispartofseriesJournal of Physics: Conference Series
dc.relation.urihttp://dx.doi.org/10.1088/1742-6596/1124/5/051059
dc.rightsCC BY http://creativecommons.org/licenses/by/4.0/
dc.titleRIE for structuring E-field processed glasses
dc.description.versionpublished version
dc.contributor.departmentDepartment of Physics and Mathematics, activities
uef.solecris.id59908288en
dc.type.publicationTieteelliset aikakauslehtiartikkelit
dc.rights.accessrights© IOP Publishing Ltd
dc.relation.doi10.1088/1742-6596/1124/5/051059
dc.description.reviewstatuspeerReviewed
dc.relation.articlenumber051059
dc.relation.issn1742-6588
dc.relation.volume1124
dc.rights.accesslevelopenAccess
dc.type.okmA1
uef.solecris.openaccessOpen access -julkaisukanavassa ilmestynyt julkaisu


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