Skip to main contentSkip to search and navigation

UEF eREPOSITORY

    • English
    • suomi
  • English 
    • English
    • suomi
  • Login
View Item 
  •   Home
  • Artikkelit
  • Luonnontieteiden ja metsätieteiden tiedekunta
  • View Item
  •   Home
  • Artikkelit
  • Luonnontieteiden ja metsätieteiden tiedekunta
  • View Item
JavaScript is disabled for your browser. Some features of this site may not work without it.

Large-angle beaming from asymmetric nanoslit-corrugation structures

Thumbnail
Files
Article (4.768Mb)
Self archived version
final draft
Date
2020
Author(s)
Li, Peng
Alam, Khairul
Partanen, Henri
Kuittinen, Markku
Kang, Guoguo
Turunen, Jari
Unique identifier
10.1088/1361-6528/ab662e
Metadata
Show full item record
More information
Research Database SoleCris

Self-archived article

Citation
Li, Peng. Alam, Khairul. Partanen, Henri. Kuittinen, Markku. Kang, Guoguo. Turunen, Jari. (2020). Large-angle beaming from asymmetric nanoslit-corrugation structures.  Nanotechnology, 31 (14) , 145204. 10.1088/1361-6528/ab662e.
Rights
© IOP Publishing Ltd
Licensed under
CC BY-NC-ND https://creativecommons.org/licenses/by-nc-nd/3.0/
Abstract

The beaming effect in single apertures surrounded by periodic corrugations and the manipulation of beaming directions from such structures has gained considerable attention since discovery. Different materials and structural profiles have been studied in this context but directional beaming at angles larger than 45° has not been achieved. We design and demonstrate nanoslits in a gold film flanked by corrugations, which give rise to beaming angles ranging from 45° to 60°. While the previous designs are based on achieving constructive interference at the aimed beaming angle, our approach complements such constructive interference with destructive interference at 0° and, as a result, enhances the directional beaming effect at angles larger than 45°. The structures are fabricated by electron beam lithography with two consecutive lift-off processes. The experimental far-field intensity distributions agree well with the designs.

Subjects
off-axis directional beaming   surface plasmon resonance(SPR)   phase modulation   subwavelength nanoslit   electron beam lithography(EBM)   
URI
https://erepo.uef.fi/handle/123456789/8094
Link to the original item
http://dx.doi.org/10.1088/1361-6528/ab662e
Publisher
IOP Publishing
Collections
  • Luonnontieteiden ja metsätieteiden tiedekunta [1109]
University of Eastern Finland
OpenAccess
eRepo
erepo@uef.fi
OpenUEF
Service provided by
the University of Eastern Finland Library
Library web pages
Twitter
Facebook
Youtube
Library blog
 sitemap
Search

Browse

All of the ArchiveResource types & CollectionsBy Issue DateAuthorsTitlesSubjectsFacultyDepartmentFull organizationSeriesMain subjectThis CollectionBy Issue DateAuthorsTitlesSubjectsFacultyDepartmentFull organizationSeriesMain subject

My Account

Login
University of Eastern Finland
OpenAccess
eRepo
erepo@uef.fi
OpenUEF
Service provided by
the University of Eastern Finland Library
Library web pages
Twitter
Facebook
Youtube
Library blog
 sitemap